论文标题
分析氢终止钻石上二维孔气体的迁移率限制机制
Analysis of the Mobility-Limiting Mechanisms of the Two-Dimensional Hole Gas on Hydrogen-Terminated Diamond
论文作者
论文摘要
在这里,我们介绍了氢终止钻石表面上二维孔气体的迁移率限制机制的分析。包括表面杂质,表面粗糙度,非极性光音子和声音子的散射速率。使用Schrodinger/Poisson求解器,分别处理重孔,轻孔和分裂带。为了将计算与实验数据进行比较,在25至700 K的温度下制造并测量了霍尔效应结构,孔板密度范围为2至6 $ \ times10^{12} {12} \; \ \ \ \ \ text {cm}^{ - 2} $,并以60至100 cm $^$ c的温度衡量的是,均在60至100 cm $^$^$^$^$^$^$^$^$^$^$^$^$^$^$^$^$^$^$^=^$ {2}。还使用了来自文献的现有数据,该数据跨越了1 $ \ times10^{13} \; \ text {cm}^{ - 2} $。我们的分析表明,对于低板密度,带电受体的表面杂质散射和表面粗糙度不足以说明低迁移率。此外,实验数据表明,在钻石表面存在远距离电势波动,并且在较低的薄纸密度下特别增强。因此,我们提出了第二种表面杂质散射,该表面杂质散射是由与C-H偶极子有关的疾病引起的。
Here we present an analysis of the mobility-limiting mechanisms of a two-dimensional hole gas on hydrogen-terminated diamond surfaces. The scattering rates of surface impurities, surface roughness, non-polar optical phonons, and acoustic phonons are included. Using a Schrodinger/Poisson solver, the heavy hole, light hole, and split-off bands are treated separately. To compare the calculations with experimental data, Hall-effect structures were fabricated and measured at temperatures ranging from 25 to 700 K, with hole sheet densities ranging from 2 to 6$\times10^{12}\;\text{cm}^{-2}$ and typical mobilities measured from 60 to 100 cm$^{2}$/(V$\cdot$s) at room temperature. Existing data from literature was also used, which spans sheet densities above 1$\times10^{13}\;\text{cm}^{-2}$. Our analysis indicates that for low sheet densities, surface impurity scattering by charged acceptors and surface roughness are not sufficient to account for the low mobility. Moreover, the experimental data suggests that long-range potential fluctuations exist at the diamond surface, and are particularly enhanced at lower sheet densities. Thus, we propose a second type of surface impurity scattering which is caused by disorder related to the C-H dipoles.