论文标题
光束驱动的血浆韦克菲尔德加速器中的受控密度向下注入
Controlled density-downramp injection in a beam-driven plasma wakefield accelerator
论文作者
论文摘要
本文介绍了光束驱动的等离子体韦克场加速度的利用，以在Desy的Flashforward设施的一个短注射器阶段通过密度向外注射来实现高质量的等离子阴极。电荷高达105 pc的电子束，几个百分之几的能量传播通过可调节有效加速电场加速2.7 gv/m。血浆阴极以非常高的注射效率为单位，无漂移。抖动的来源，对所得光束的发射和差异进行了研究和建模，以及改进性能的策略，这些策略将进一步提高血浆阴极的广泛应用应用，并具有证明的操作稳定性
This paper describes the utilization of beam-driven plasma wakefield acceleration to implement a high-quality plasma cathode via density-downramp injection in a short injector stage at the FLASHForward facility at DESY. Electron beams with charge of up to 105 pC and energy spread of a few percent were accelerated by a tunable effective accelerating field of up to 2.7 GV/m. The plasma cathode was operated drift-free with very high injection efficiency. Sources of jitter, the emittance and divergence of the resulting beam were investigated and modeled, as were strategies for performance improvements that would further increase the wide-ranging applications for a plasma cathode with the demonstrated operational stability
