论文标题
在墙壁附近有滑动和剪切的情况下,在粒子上抬起和阻力力
Lift and drag forces acting on a particle moving in the presence of slip and shear near a wall
论文作者
论文摘要
通过直接数值模拟研究了作用在单壁构造流中的有限滑动的小球形颗粒上的升力和阻力力。分析滑动速度对颗粒力的影响是低滑动和剪切雷诺数的分离距离的函数($ 10^{ - 3} \ leqre_γ,re _ {\ text {slip}} \ leq leq 10^{ - 1} $在quiescent和lineareareheare flow中的影响。一个对任意粒子壁分离距离和$re_γ的广义升力模型,re _ {\ text {slip}} \ leq 10^{ - 1} $是根据模拟的结果开发的。现在,提出的模型可以在存在或不存在滑动的情况下预测线性剪切流中的升力力,并且在存在滑动时静止流动。还将现有的阻力模型与静态和线性剪切流的数值结果进行比较,以确定哪些模型最准确地捕获了近颗粒雷诺数的近壁滑动速度。最后,我们将拟议的升力模型的结果与浮力颗粒的先前实验结果以及中性(无力度)颗粒的数值结果进行比较,以静态和线性剪切流中的壁上移动。提出的广义升力模型可用于预测生物和工业流中粒子悬浮液的行为,其中基于滑动和剪切的粒子雷诺数为$ \ MATHCAL {o}(10^{ - 1})$ and Ploving。
The lift and drag forces acting on a small spherical particle moving with a finite slip in single-wall-bounded flows are investigated via direct numerical simulations. The effect of slip velocity on the particle force is analysed as a function of separation distance for low slip and shear Reynolds numbers ($10^{-3} \leq Re_γ, Re_{\text{slip}} \leq 10^{-1}$) in both quiescent and linear shear flows. A generalised lift model valid for arbitrary particle-wall separation distances and $Re_γ, Re_{\text{slip}} \leq 10^{-1}$ is developed based on the results of the simulations. The proposed model can now predict the lift forces in linear shear flows in the presence or absence of slip,and in quiescent flows when slip is present. Existing drag models are also compared with numerical results for both quiescent and linear shear flows to determine which models capture near wall slip velocities most accurately for low particle Reynolds numbers. Finally, we compare the results of the proposed lift model to previous experimental results of buoyant particles and to numerical results of neutrally-buoyant (force-free) particles moving near a wall in quiescent and linear shear flows. The generalised lift model presented can be used to predict the behaviour of particle suspensions in biological and industrial flows where the particle Reynolds numbers based on slip and shear are $\mathcal{O}(10^{-1})$ and below.