论文标题
通过电子束光刻制造的反射光仪的限制光谱分辨率
Limiting Spectral Resolution of a Reflection Grating Made via Electron-Beam Lithography
论文作者
论文摘要
光栅使从X射线到光学的色散光谱能够出色，并在拟议的旗舰和Smallsats中以突出特征。这些未来任务的严格绩效要求需要评估当前的光栅制造中最先进的工作是否会限制光谱仪的性能。在这项工作中，我们使用电子束光刻（EBL）制造了1.5毫米厚的1000 nm周期，这是一种有前途的光刻技术，用于为未来的天文学观测值绘制光栅。我们通过对以+/- 1阶产生的衍射波偏度来评估该光栅的限制光谱分辨率。我们的测量结果表明，这种光栅的性能至少为r〜14,600，并且我们的评估受我们的干涉测量误差的限制。量化了EBL缝合误差对光栅性能的影响，并提出了测量自定义，弯曲光栅的周期误差的途径。
Gratings enable dispersive spectroscopy from the X-ray to the optical, and feature prominently in proposed flagships and SmallSats alike. The exacting performance requirements of these future missions necessitate assessing whether the present state-of-the-art in grating manufacture will limit spectrometer performance. In this work, we manufacture a 1.5 mm thick, 1000 nm period at grating using electron-beam lithography (EBL), a promising lithographic technique for patterning gratings for future astronomical observatories. We assess the limiting spectral resolution of this grating by interferometrically measuring the diffracted wavefronts produced in +/-1st order. Our measurements show this grating has a performance of at least R ~ 14,600, and that our assessment is bounded by the error of our interferometric measurement. The impact of EBL stitching error on grating performance is quantifed, and a path to measuring the period error of customized, curved gratings is presented.
