论文标题
通过直接深层构建的胶体量子井的自动振动U-激动
Self-Resonant u-Lasers of Colloidal Quantum Wells Constructed by Direct Deep Patterning
论文作者
论文摘要
在这里,报道了由胶体量子井(CQW)溶液制成的自动谐振全胶体U激光器的第一个说明。开发了一种深层图案技术,以制造明确定义的高方面比率在芯片上CQW谐振器,由光向指导和平面内反射器制成。图案层的CQW用锋利的边缘和无剩余的抬起表面封闭。另外,该方法成功应用于包括胶体量子点和金属纳米颗粒在内的各种纳米颗粒。据观察,模式过程不会影响固定在已达到的模式中的纳米晶体(NCS),而NCS的不同物理和化学性质仍然是原始的。由于提出的模式方法的能力,具有子波长侧面特征大小和微米尺度高度的NC的模式以1:15的宽高比(<100 nm的横向图案特征至>1.5μm膜厚度)。制造的波导耦合激光器可确保平面激光。设计的CQW谐振器结构的光谱特性通过完整电磁溶液的数值模型得到很好的支持。 CQWS的这种直接深度图案的自我谐振U激光器对光子电路的芯片整合具有很大的希望。
Here, the first account of self-resonant fully-colloidal u-lasers made from colloidal quantum well (CQW) solution is reported. A deep patterning technique is developed to fabricate well-defined high aspect-ratio on-chip CQW resonators made of grating waveguides and in-plane reflectors. CQWs of the patterned layers are closed-packed with sharp edges and residual-free lifted-off surfaces. Additionally, the method is successfully applied to various nanoparticles including colloidal quantum dots and metal nanoparticles. It is observed that the patterning process does not affect the nanocrystals (NCs) immobilized in the attained patterns and different physical and chemical properties of the NCs remain pristine. Thanks to capability of the proposed patterning method, patterns of NCs with sub-wavelength lateral feature size and micron-scale height are fabricated in the aspect ratios of 1:15 (<100 nm lateral patterned features to >1.5 μm film thickness). The fabricated waveguide-coupled laser, enabling tight optical confinement, assures in-plane lasing. The spectral characteristics of the designed CQW resonator structure are well supported with a numerical model of full electromagnetic solutions. Such directly deep-patterned self-resonant u-lasers of CQWs hold great promise for on-chip integration to photonic circuits.