论文标题
在千分尺和纳米尺寸的结构中制作大悬垂
Making large overhangs in micrometer and nanometer-sized structures
论文作者
论文摘要
我们描述了两个通用程序，用于制造具有较大悬垂和高方面支持支柱的微观结构。第一种方法在微或纳米柱上使用静态角度的干蚀刻来产生初始悬垂，然后进行湿蚀刻以进一步侵蚀。第二种方法在用保护树脂成图案的平面上使用时间相关的角度蚀刻，以减少制造这些对象所需的光刻步骤的数量。时间依赖性的干蚀刻再次是湿蚀刻。对于第二种方法，我们得出了一个公式，该公式提供了攻击角必须在目标材料内的已知蚀刻速率，所需悬垂的深度（底切）和瞬时攻击角度的速率。
We describe two general procedures for fabricating microstructures with large overhangs and high aspect-ratio support pillars. The first method uses a static angled dry etch on micro- or nano-pillars to create an initial overhang, followed by wet etching for further erosion. The second method uses a time-dependent angled etch on a flat plane patterned with protective resin, to reduce the number of lithography steps needed to make these objects. The time-dependent dry etch is again followed by a wet etch. For the second method we derive a formula that provides the rate at which the attack angle must evolve, given a known etch rate within the target material, the depth of the desired overhang (undercut), and the instantaneous attack angle.
