论文标题

硅T-中心的第一原理研究

First principles study of the T-center in Silicon

论文作者

Dhaliah, Diana, Xiong, Yihuang, Sipahigil, Alp, Griffin, Sinéad M., Hautier, Geoffroy

论文摘要

硅的T-Center是一个著名的碳颜色中心,最近已考虑用于量子技术应用。使用第一原理计算,我们表明激发态是由由局部缺陷态制成的缺陷型激子形成的。局部状态具有很强的碳\ textit {p}特征,并让人联想到乙基自由基分子中未配对电子的定位。计算出缺陷型激子的辐射寿命为$ $ s的阶,比其他量子缺陷(例如钻石中的NV中心)长得多,并且与实验一致。由于形成缺陷结合的激子的局部和离域状态的截然不同的性质,寿命较长与小型过渡偶极矩有关。最后,我们使用第一原理计算来评估T-中心的稳定性。我们发现,在保持化学计量固定时,T-Center稳定反对分解为更简单的缺陷。但是,我们确定T-Center很容易容易出现(DE)氢化,因此需要非常精确的退火条件(温度和大气)才能有效形成。

The T-center in silicon is a well-known carbon-based color center that has been recently considered for quantum technology applications. Using first principles computations, we show that the excited state is formed by a defect-bound exciton made of a localized defect state occupied by an electron to which a hole is bound. The localized state is of strong carbon \textit{p} character and reminiscent of the localization of the unpaired electron in the ethyl radical molecule. The radiative lifetime for the defect-bound exciton is calculated to be on the order of $μ$s, much longer than other quantum defects such as the NV center in diamond and in agreement with experiments. The longer lifetime is associated with the small transition dipole moment as a result of the very different nature of the localized and delocalized states forming the defect-bound exciton. Finally, we use first principles calculations to assess the stability of the T-center. We find the T-center to be stable against decomposition into simpler defects when keeping the stoichiometry fixed. However, we identify that the T-center is easily prone to (de)hydrogenation and so requires very precise annealing conditions (temperature and atmosphere) to be efficiently formed.

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