论文标题
电屏障及其通过调整(Zn,mg)o组成(ga)S2的组成:实现超过14%功率转换效率的系统方法
Electrical barriers and their elimination by tuning (Zn,Mg)O composition in Cu(In,Ga)S2: Systematic approach to achieve over 14% power conversion efficiency
论文作者
论文摘要
无硒的CU(in,GA)S2太阳能电池中的传统CD缓冲层导致开路电压降低,因为Cu(in,GA)S2/CDS接口的负导带偏移了负传导带。减少这种损失需要通过替代缓冲层替换CD。但是,由于在其他接口(例如缓冲液/ZnO I-layer之间),替代缓冲层可能在设备中引入电屏障。这项研究旨在减少界面重组,并使用Zn1-XMGXO和Al掺杂的Zn1-XMGXO缓冲液和使用原子层沉积和Magnetron溅射的Zn1-XMGXO和Al掺杂的Zn1-XMGXO缓冲液和I-layer组合的组合消除Cu(in Ga)S2太阳能电池中的电屏障。用这些层制备的设备以电流 - 电压和光致发光测量为特征。进行数值模拟以理解电障碍对设备特性的影响。确定了Zn1 XMGXO X = 0.27的最佳组成,用于与Cu(IN,GA)S2对齐的适当传导带,带gap 〜1.6 eV,抑制界面重组和避免障碍。优化的缓冲液组合物以及合适的I层导致效率为14%的设备,开路电压为943 mV。用ZnO和Al制备的设备的光电测量比较:(Zn,mg)O显示了用Al:(Zn,mg)O I-i-layer代替ZnO I-Layer,以实现高效设备。
Traditional CdS buffer layer in selenium-free Cu(In,Ga)S2 solar cells leads to reduced open-circuit voltage because of a negative conduction band offset at the Cu(In,Ga)S2/CdS interface. Reducing this loss necessitates the substitution of CdS by an alternative buffer layer. However, the substitute buffer layer may introduce electrical barriers in the device due to unfavorable band alignment at the other interfaces such as between buffer/ZnO i-layer. This study aims to reduce interface recombinations and eliminate electrical barriers in Cu(In,Ga)S2 solar cells using a combination of Zn1-xMgxO and Al-doped Zn1-xMgxO buffer and i-layer combination deposited using atomic layer deposition and magnetron sputtering, respectively. The devices prepared with these layers are characterized by current-voltage and photoluminescence measurements. Numerical simulations are performed to comprehend the influence of electrical barriers on the device characteristics. An optimal composition of Zn1 xMgxO x = 0.27 is identified for a suitable conduction band alignment with Cu(In,Ga)S2 with a bandgap of ~1.6 eV, suppressing interface recombination and avoiding barriers. Optimized buffer composition together with a suitable i-layer led to a device with 14 % efficiency and an open-circuit voltage of 943 mV. A comparison of optoelectronic measurements for devices prepared with ZnO and Al:(Zn,Mg)O shows the necessity to replace the ZnO i-layer with Al:(Zn,Mg)O i-layer for a high-efficiency device.