论文标题
温度诱导的氮化硼层中声子能量的巨大变化
Temperature induced giant shift of phonon energy in epitaxial boron nitride layers
论文作者
论文摘要
大区域氮化硼Epilayers增长的最新进展为未来应用开辟了新的可能性。但是,在很大程度上尚不清楚附着的二维BN层如何与其底物相互作用以及其性质如何受到缺陷的影响。在这项工作中,我们研究了通过金属有机蒸汽相外观(MOVPE)生长的HBN层在160-540K的温度范围内使用傅立叶转换红外(FTIR)光谱。我们的测量揭示了对成年和分配型和扭曲的外部外壳分层的层相互作用的强烈差异。皱纹的形成可以降低层底层界面的应变,从而解释了生长层的相互作用较弱的相互作用,该界面的应变仅在有限的温度范围内发生。最引人注目的结果是观察$ e_ {1u} $声子在狭窄温度范围内的巨大增加的声子能量(最高为$ \ sim6 $ cm $^{ - 1} $。我们表明,异常的幅度和温度范围通过紫外光照明强烈改变。观察到的巨型效应是用浅陷阱和不同缺陷之间的电荷重新分布导致的应变产生来解释的,这可以解释是HBN中强电子波耦合的结果。观察到的异常温度范围狭窄表明,可能会进一步增强效果,例如通过静脉造成效果,预期的是SP $^2 $硝酸硼。
The recent progress in the growth of large-area boron nitride epilayers opens up new possibilities for future applications. However, it remains largely unclear how weakly attached two-dimensional BN layers interact with their substrate and how their properties are influenced by defects. In this work, we investigate hBN layers grown by Metal Organic Vapor Phase Epitaxy (MOVPE) using Fourier-transform Infrared (FTIR) spectroscopy in the temperature range of 160-540 K. Our measurements reveal strong differences in the character of layer-substrate interaction for as-grown and delaminated epitaxial layers. A much weaker interaction of as-grown layers is explained by wrinkles formation that reduces strain at the layer-substrate interface, which for layers transferred to other substrates occurs only in a limited temperature range. The most striking result is the observation of a giant increase in the $E_{1u}$ phonon energy of up to $\sim6$ cm$^{-1}$ in a narrow temperature range. We show that the amplitude and temperature range of the anomaly is strongly modified by UV light illumination. The observed giant effect is explained in terms of strain generation resulting from charge redistribution between shallow traps and different defects, which can be interpreted as a result of strong electron-phonon coupling in hBN. The observed narrow temperature range of the anomaly indicates that the effect may be further enhanced for example by electrostrictive effects, expected for sp$^2$ boron nitride.