论文标题
在几乎衍射限制的光谱仪中确定畸变
Determining the aberrations in a nearly diffraction-limited spectrograph
论文作者
论文摘要
我们提出了一种在几乎衍射限制的光谱仪中确定静态畸变的方法，例如通过对齐或制造误差引入。我们考虑了一个仪器，其两个阶段由位于中间焦平面的狭缝或图像切片机分离。在这样的光谱仪中，在缝隙之后的第二阶段，在缝隙之前，在第二阶段，在第二阶段，第二阶段区分畸变并不是微不足道的。但是，我们的方法实现了这一点。分别测量这些像差可以通过重新调整或其他方式减少它们的可能性，从而改善仪器的光学性能。该方法基于与点源的多个图像的拟合模型，其源垂直于狭缝和第二阶段或检测器受控的散热器的源位移。将模型拟合到这些图像允许在两个阶段确定畸变。我们的关键发现是，流离失所和散落的图像提供了其他信息，使我们能够打破两个阶段之间的歧义。我们提出验证该方法性能的模拟。
We present a method to determine the static aberrations in a nearly diffraction-limited spectrograph introduced, for example, by alignment or manufacturing errors. We consider an instrument with two stages separated by a slit or image slicer located in the intermediate focal plane. In such a spectrograph, it is not trivial to distinguish aberrations in the first stage, before the slit, from those in the second, after the slit. However, our method achieves this. Measuring these aberrations separately opens the possibility of reducing them, by realignment or other means, and thereby improving the optical performance of the instrument. The method is based on fitting models to multiple images of a point source, with controlled displacements of the source perpendicular to the slit and controlled defocuses of the second stage or the detector. Fitting models to these images allows the determination of the aberrations in both stages. Our key discovery is that the displaced and defocused images provide additional information which allows us to break the ambiguity between the two stages. We present simulations that validate the performance of the method.
