论文标题

朝着有效的结构预测和多光谱图中的预补偿

Towards efficient structure prediction and pre-compensation in multi-photon lithography

论文作者

Lang, Nicolas, Enns, Sven, Hering, Julian, von Freymann, Georg

论文摘要

几年来,微观3D打印技术一直在对行业和研究中越来越兴趣。不幸的是,制造的结构总是偏离各自的期望,通常是由印刷过程中和之后的物理化学特性引起的。在这里,我们展示了朝着简单,快速且易于实现的算法的第一步,以预测多光谱光刻的最终结构地形 - 也称为直接激光写作(DLW)。 DLW的三个主要步骤,(i)照片树脂的暴露,(ii)树脂的交联和(iii)随后的收缩率通过数学操作近似,显示出与实验观察结果一致的有希望的结果。例如,径向对称chir的地形的未修饰的3D打印与我们的预测地形仅为0.46 $μ$ m之间的根平方误差(RMSE),而这种3D打印与其目标之间的RMSE为1.49 $ $ m。因此,我们的可靠预测可以在打印过程之前使用,以最大程度地减少目标结构与最终3D打印结构之间的不希望的偏差。使用下坡 - 简单算法来识别最佳预测参数,我们能够通过在最佳情况下仅通过两个校正循环将RMSE从4.04 $ $ M降低到0.33 $ $ m $ m(RMSE = 0.72 $ M $ m $ $ m循环后)。因此,这种方法可以消除对许多结构优化循环的需求,以便将来产生高质量和高质量的微型结构。

Microscale 3D printing technologies have been of increasing interest in industry and research for several years. Unfortunately, the fabricated structures always deviate from the respective expectations, often caused by the physico-chemical properties during and after the printing process. Here, we show first steps towards a simple, fast and easy to implement algorithm to predict the final structure topography for multi-photon lithography - also known as Direct Laser Writing (DLW). The three main steps of DLW, (i) exposure of a photo resin, (ii) cross-linking of the resin, and (iii) subsequent shrinkage are approximated by mathematical operations, showing promising results in coincidence with experimental observations. E.g., the root-mean-square error (rmse) between the unmodified 3D print of a radial-symmetrically chirped topography and our predicted topography is only 0.46 $μ$m, whereas the rmse between this 3D print and its target is 1.49 $μ$m. Thus, our robust predictions can be used prior to the printing process to minimize undesired deviations between the target structure and the final 3D printed structure. Using a Downhill-Simplex algorithm for identifying the optimal prediction parameters, we were able to reduce the rmse from 4.04 $μ$m to 0.33 $μ$m by only two correction loops in our best-case scenario (rmse = 0.72 $μ$m after one loop). Consequently, this approach can eliminate the need for many structural optimization loops to produce highly conformal and high quality micro structures in the future.

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