论文标题

解决方案加工铜(i)硫氰酸酯(CUSCN)和I $ _2 $兴奋剂的缺陷 - 修改的孔捕获状态的起源

Origin of Hole-Trapping States in Solution-Processed Copper(I) Thiocyanate (CuSCN) and Defect-Healing by I$_2$ Doping

论文作者

Worakajit, Pimpisut, Kidkhunthod, Pinit, Waiprasoet, Saran, Nakajima, Hideki, Sudyoadsuk, Taweesak, Promarak, Vinich, Pattanasattayavong, Pichaya

论文摘要

溶液处理的铜(i)硫氰酸酯(CUSCN)通常表现出低距离顺序的低结晶度;缺陷导致高密度的陷阱状态限制设备性能。尽管CUSCN具有广泛的电子应用,但尚未对其缺陷属性进行详细研究。通过X射线吸收光谱,发现由标准的基于二乙基硫化物的配方制备的原始CUSCN被发现包含协调不足的Cu原子,这表明存在SCN空位。通过向处理解决方案添加坚固的I $ _2 $引入缺陷钝化策略。在较小的浓度下,碘被发现为I $^ - $,可以代替缺失的SCN $^ - $配体,有效地治愈了有缺陷的站点并恢复CU周围的协调。在薄膜晶体管中应用I $ _2 $掺杂的CUSCN作为P通道表明,最佳掺杂浓度为0.5 mol%,孔迁移率增加了五倍以上。重要的是,随着I $ _2 $掺杂方法导致缺陷愈合效果,同时避免产生有害的杂质状态,因此ON/OFF电流比和子阈值特征也有所改善。对电容 - 电压特性的分析证实了陷阱状态密度在I $ _2 $添加后降低。设备的接触电阻和偏置压力稳定性也有所改善。这项工作显示了改善CUSCN孔传输特性的简单有效途径,该途径适用于广泛的电子和光电应用。

Solution-processed copper(I) thiocyanate (CuSCN) typically exhibits low crystallinity with short-range order; the defects result in a high density of trap states that limit the device performance. Despite the extensive electronic applications of CuSCN, its defect properties have not been studied in detail. Through X-ray absorption spectroscopy, pristine CuSCN prepared from the standard diethyl sulfide-based recipe is found to contain under-coordinated Cu atoms, pointing to the presence of SCN vacancies. A defect passivation strategy is introduced by adding solid I$_2$ to the processing solution. At small concentrations, the iodine is found to exist as I$^-$ which can substitute for the missing SCN$^-$ ligand, effectively healing the defective sites and restoring the coordination around Cu. Applying I$_2$-doped CuSCN as a p-channel in thin-film transistors shows that the hole mobility increases by more than five times at the optimal doping concentration of 0.5 mol%. Importantly, the on/off current ratio and the subthreshold characteristics also improve as the I$_2$ doping method leads to the defect healing effect while avoiding the creation of detrimental impurity states. An analysis of the capacitance-voltage characteristics corroborates that the trap state density is reduced upon I$_2$ addition. The contact resistance and bias-stress stability of the devices also improve. This work shows a simple and effective route to improve hole transport properties of CuSCN which is applicable to wide-ranging electronic and optoelectronic applications.

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