论文标题
用于观察空气退火期间光学涂层的原位变化的成像散射仪
Imaging Scatterometer for Observing In-Situ Changes to Optical Coatings During Air Annealing
论文作者
论文摘要
已证明非晶光学涂层的退火通常可以减少光吸收,光学散射和机械损耗,并具有较高的温度退火可提供更好的效果。可实现的最高温度仅限于涂层损伤(例如结晶,开裂或起泡)的水平。加热造成的涂层损坏通常仅在退火后静态观察到。一种实验方法,可以动态观察在退火过程中如何以及在什么温度范围内发生什么情况,因为其结果可以为制造和退火过程提供信息,以最终实现更好的涂层性能。我们开发了一种新的仪器,该仪器采用工业退火烤箱,并在其侧面切开孔,以阐明光学样品,并在现场和在退火过程中实时观察其涂层散布和最终的损坏机制。我们提出的结果表明,融合二氧化硅底物上掺杂二氧化钛的坦塔拉涂层的变化的原位观察。我们获得了在退火过程中这些变化的演变的空间图像(映射),优于X射线衍射,电子束或拉曼方法的优势。我们根据文献中的其他实验来推断这些变化是由于结晶引起的。我们进一步讨论了该设备的效用,以观察其他形式的涂层损伤,例如开裂和水泡。
Annealing of amorphous optical coatings has been shown to generally reduce optical absorption, optical scattering, and mechanical loss, with higher temperature annealing giving better results. The achievable maximum temperatures are limited to the levels at which coating damage, such as crystallization, cracking, or bubbling will occur. Coating damage caused by heating is typically only observed statically, after annealing. An experimental method to dynamically observe how and over what temperature range such damage occurs during annealing is desirable as its results could inform manufacturing and annealing processes to ultimately achieve better coating performance. We developed a new instrument that features an industrial annealing oven with holes cut into its sides for viewports to illuminate optical samples and observe their coating scatter and eventual damage mechanisms in-situ and in real-time during annealing. We present results that demonstrate in-situ observation of changes to titania-doped tantala coatings on fused silica substrates. We obtain a spatial image (mapping) of the evolution of these changes during annealing, an advantage over x-ray diffraction, electron beam, or Raman methods. We infer, based on other experiments in the literature, these changes to be due to crystallization. We further discuss the utility of this apparatus for observing other forms of coating damage such as cracking and blisters.